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Download or read book Single Liquid Source Plasma Enhanced Metalorganic Chemical Vapor Deposition of YBa2Cu3O7-x Thin Films written by and published by . This book was released on 1992 with total page 13 pages. Available in PDF, EPUB and Kindle. Book excerpt: High quality YBa2Cu3O7-x films were grown in-situ on LaA103 (100) by a novel single liquid source plasma-enhanced metalorganic chemical vapor deposition process. The metalorganic complexes M(thd)n, (thd = 2,2,6,6- tetramethyl-3,5-heptanedionate; M = Y, Ba, Cu) were dissolved in an organic solution and injected into a vaporizer immediately upstream of the reactor inlet. The single liquid source technique dramatically simplifies current CVD processing and can significantly improve the process reproducibility. X-ray diffraction measurements indicated that single phase, highly c-axis oriented YBa2Cu3O7-x was formed in-situ at a substrate temperature 680 deg C. The as-deposited films exhibited a mirror-like surface, had transition temperature Tco = 89 K, Delta Tc