Simulation of Deposition Processes with PECVD Apparatus
Author | : Juergen Geiser |
Publisher | : |
Total Pages | : 0 |
Release | : 2012 |
ISBN-10 | : 1621005437 |
ISBN-13 | : 9781621005438 |
Rating | : 4/5 (438 Downloads) |
Download or read book Simulation of Deposition Processes with PECVD Apparatus written by Juergen Geiser and published by . This book was released on 2012 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book discusses the study of simulating the growth of a thin film by chemical vapor deposition (CVD) processes. In recent years, due to the research in producing high-temperature films by depositing low pressures, the processes have increased and understanding the control mechanism of such processes has become very important. An underlying hierarchy of models for low-temperature and low-pressure plasma is presented in order to discuss the processes that can be used to implant or deposit thin layers of important materials. Due to the multi-scale problem of the flow and reaction processes, the authors propose multi-scale problems which are divided into near-field and far-field models.