Excimer Laser Crystallization of Silicon Thin-Films for Monolithic 3D Integration

Excimer Laser Crystallization of Silicon Thin-Films for Monolithic 3D Integration
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Book Synopsis Excimer Laser Crystallization of Silicon Thin-Films for Monolithic 3D Integration by : Fabio Carta

Download or read book Excimer Laser Crystallization of Silicon Thin-Films for Monolithic 3D Integration written by Fabio Carta and published by . This book was released on 2015 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: As the dimensional scaling of complementary MOS (CMOS) devices reaches its limits, three dimensional ICs (3DICs) are increasingly being considered as a path to achieve higher device densities. 3DICs offer a way to increase density by using multiple device layers on the same die, reducing the interconnect distance and allowing for a decrease in signal delay. Among different fabrication techniques, monolithic 3D integration is potentially more cost effective but requires high performance devices, a process compatible with transistor integration in the BEOL stack and needs to deliver a high device density and uniformity in order to be adopted by the very large scale integration (VLSI) industry. This work focuses on a particular laser crystallization technique to achieve monolithic device integration. The technique, called Excimer Laser Crystallization (ELC), makes use of an excimer laser to achieve a large grain polycrystalline thin-film starting from an amorphous layer, allowing integration of high quality thin-film transistors (TFTs).


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