ULSI Semiconductor Technology Atlas

ULSI Semiconductor Technology Atlas
Author :
Publisher : John Wiley & Sons
Total Pages : 688
Release :
ISBN-10 : 0471457728
ISBN-13 : 9780471457725
Rating : 4/5 (725 Downloads)

Book Synopsis ULSI Semiconductor Technology Atlas by : Chih-Hang Tung

Download or read book ULSI Semiconductor Technology Atlas written by Chih-Hang Tung and published by John Wiley & Sons. This book was released on 2003-10-06 with total page 688 pages. Available in PDF, EPUB and Kindle. Book excerpt: More than 1,100 TEM images illustrate the science of ULSI The natural outgrowth of VLSI (Very Large Scale Integration), Ultra Large Scale Integration (ULSI) refers to semiconductor chips with more than 10 million devices per chip. Written by three renowned pioneers in their field, ULSI Semiconductor Technology Atlas uses examples and TEM (Transmission Electron Microscopy) micrographs to explain and illustrate ULSI process technologies and their associated problems. The first book available on the subject to be illustrated using TEM images, ULSI Semiconductor Technology Atlas is logically divided into four parts: * Part I includes basic introductions to the ULSI process, device construction analysis, and TEM sample preparation * Part II focuses on key ULSI modules--ion implantation and defects, dielectrics and isolation structures, silicides/salicides, and metallization * Part III examines integrated devices, including complete planar DRAM, stacked cell DRAM, and trench cell DRAM, as well as SRAM as examples for process integration and development * Part IV emphasizes special applications, including TEM in advanced failure analysis, TEM in advanced packaging development and UBM (Under Bump Metallization) studies, and high-resolution TEM in microelectronics This innovative guide also provides engineers and managers in the microelectronics industry, as well as graduate students, with: * More than 1,100 TEM images to illustrate the science of ULSI * A historical introduction to the technology as well as coverage of the evolution of basic ULSI process problems and issues * Discussion of TEM in other advanced microelectronics devices and materials, such as flash memories, SOI, SiGe devices, MEMS, and CD-ROMs


ULSI Semiconductor Technology Atlas Related Books

ULSI Semiconductor Technology Atlas
Language: en
Pages: 688
Authors: Chih-Hang Tung
Categories: Technology & Engineering
Type: BOOK - Published: 2003-10-06 - Publisher: John Wiley & Sons

DOWNLOAD EBOOK

More than 1,100 TEM images illustrate the science of ULSI The natural outgrowth of VLSI (Very Large Scale Integration), Ultra Large Scale Integration (ULSI) ref
Advanced Interconnects for ULSI Technology
Language: en
Pages: 616
Authors: Mikhail Baklanov
Categories: Technology & Engineering
Type: BOOK - Published: 2012-04-02 - Publisher: John Wiley & Sons

DOWNLOAD EBOOK

Finding new materials for copper/low-k interconnects is critical to the continuing development of computer chips. While copper/low-k interconnects have served w
Advanced Interconnects for ULSI Technology
Language: en
Pages: 616
Authors: Mikhail Baklanov
Categories: Technology & Engineering
Type: BOOK - Published: 2012-02-17 - Publisher: John Wiley & Sons

DOWNLOAD EBOOK

Finding new materials for copper/low-k interconnects is critical to the continuing development of computer chips. While copper/low-k interconnects have served w
ULSI Technology
Language: en
Pages: 756
Authors: C. Y. Chang
Categories: Technology & Engineering
Type: BOOK - Published: 1996 - Publisher: McGraw-Hill Science, Engineering & Mathematics

DOWNLOAD EBOOK

"This text follows the tradition of Sze's highly successful pioneering text on VLSI technology and is updated with the latest advances in the field of microelec
Characterization and Metrology for ULSI Technology: 2003
Language: en
Pages: 868
Authors: David G. Seiler
Categories: Computers
Type: BOOK - Published: 2003-10-08 - Publisher: American Institute of Physics

DOWNLOAD EBOOK

The worldwide semiconductor community faces increasingly difficult challenges as it moves into the manufacturing of chips with feature sizes approaching 100 nm