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Reaction Mechanisms and Dynamics in the Early Stage of High-κ Oxide Atomic Layer Deposition
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Authors: Giulio D'Acunto
Categories: Atomic layer deposition
Type: BOOK - Published: 2022 - Publisher:

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Atomic layer deposition (ALD) is an outstanding deposition technique to deposit highly conformal and uniform thin films with atomic precision. In particular, AL
In Situ Infrared Spectroscopy Study of Atomic Layer Deposition of High-kappa Metal Oxide and Metal on Passivated Silicon Surfaces
Language: en
Pages: 199
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Categories: Silicon
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Atomic layer deposition (ALD) is a novel and promising film deposition method for microelectronics and many other areas with documented commercial success. Nota
Surface and Subsurface Reaction Mechanisms in Atomic Layer Deposition of Metals and Metal Oxides
Language: en
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Authors: Joel Richard Schneider
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Nanotechnology has shown remarkable versatility and strength in response to large-scale challenges facing society today, despite many of its technical applicati
Chemistry of Atomic Layer Deposition
Language: en
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Authors: Seán Thomas Barry
Categories: Technology & Engineering
Type: BOOK - Published: 2021-11-08 - Publisher: Walter de Gruyter GmbH & Co KG

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This book will help chemists and non-chemists alike understand the fundamentals of surface chemistry and precursor design, and how these precursors drive the pr
Atomic Layer Deposition (ALD)
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Authors: Callisto Joan MacIsaac
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Modern society demands smaller, more precise devices for both microelectronic and energy technologies. The development of methods and processes that can deposit