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Atomic layer deposition (ALD) is an outstanding deposition technique to deposit highly conformal and uniform thin films with atomic precision. In particular, AL
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Atomic layer deposition (ALD) is a novel and promising film deposition method for microelectronics and many other areas with documented commercial success. Nota
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Nanotechnology has shown remarkable versatility and strength in response to large-scale challenges facing society today, despite many of its technical applicati
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Type: BOOK - Published: 2021-11-08 - Publisher: Walter de Gruyter GmbH & Co KG
This book will help chemists and non-chemists alike understand the fundamentals of surface chemistry and precursor design, and how these precursors drive the pr
Language: en
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Type: BOOK - Published: 2018 - Publisher:
Modern society demands smaller, more precise devices for both microelectronic and energy technologies. The development of methods and processes that can deposit