Related Books
Language: en
Pages: 1173
Pages: 1173
Type: BOOK - Published: 2005-12-16 - Publisher: Elsevier
The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in t
Language: en
Pages: 298
Pages: 298
Type: BOOK - Published: 2003-04-30 - Publisher: Springer Science & Business Media
Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characte
Language: en
Pages: 629
Pages: 629
Type: BOOK - Published: 2002 - Publisher:
The 2nd edition contains new chapters on contamination and contamination control that describe the basics and the issues. Another new chapter on meteorology exp
Language: en
Pages: 947
Pages: 947
Type: BOOK - Published: 2014-09-19 - Publisher: Cambridge University Press
This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposit
Language: en
Pages: 614
Pages: 614
Type: BOOK - Published: 2010-12-13 - Publisher: William Andrew
An important resource for students, engineers and researchers working in the area of thin film deposition using physical vapor deposition (e.g. sputtering) for