In Situ Process Diagnostics and Modeling: Volume 569

In Situ Process Diagnostics and Modeling: Volume 569
Author :
Publisher :
Total Pages : 226
Release :
ISBN-10 : UOM:39015041887525
ISBN-13 :
Rating : 4/5 ( Downloads)

Book Synopsis In Situ Process Diagnostics and Modeling: Volume 569 by : Orlando Auciello

Download or read book In Situ Process Diagnostics and Modeling: Volume 569 written by Orlando Auciello and published by . This book was released on 1999-08-11 with total page 226 pages. Available in PDF, EPUB and Kindle. Book excerpt: Papers from an April 1999 symposium demonstrate the need for the development and application of a variety of complementary in situ, real-time characterization techniques to advance the science and technology of thin films and interfaces critical to the development of a new generation of thin-film-based devices. Papers are arranged in sections on in situ ion and electron-beam analysis, in situ spectroscopic ellipsometry and other optical characterization, in situ diagnostics and modeling, in situ emission and optical characterization techniques, and in situ X-ray, TEM, and STM/AFM characterization and processing control. Auciello is affiliated with Argonne National Laboratory. Annotation copyrighted by Book News, Inc., Portland, OR


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