Germanosilicide Contacts to Ultra-shallow Pn Junctions of Nanoscale CMOS Integrated Circuits by Selective Deposition of In-situ Doped Silicon-germanium Alloys
Author | : Jing Liu |
Publisher | : |
Total Pages | : 154 |
Release | : 2003 |
ISBN-10 | : OCLC:52208361 |
ISBN-13 | : |
Rating | : 4/5 ( Downloads) |
Book Synopsis Germanosilicide Contacts to Ultra-shallow Pn Junctions of Nanoscale CMOS Integrated Circuits by Selective Deposition of In-situ Doped Silicon-germanium Alloys by : Jing Liu
Download or read book Germanosilicide Contacts to Ultra-shallow Pn Junctions of Nanoscale CMOS Integrated Circuits by Selective Deposition of In-situ Doped Silicon-germanium Alloys written by Jing Liu and published by . This book was released on 2003 with total page 154 pages. Available in PDF, EPUB and Kindle. Book excerpt: Keywords: germanosilicide, silicide, silicon germanium, contact resistance, ultra-shallow junction, source drain, CMOS.