Fabrication of Silicon Nanowires and the Effects of Different Parameters on The Fabrication Result
Author | : Nassim Mashayekh |
Publisher | : |
Total Pages | : 69 |
Release | : 2014 |
ISBN-10 | : OCLC:1135021555 |
ISBN-13 | : |
Rating | : 4/5 ( Downloads) |
Download or read book Fabrication of Silicon Nanowires and the Effects of Different Parameters on The Fabrication Result written by Nassim Mashayekh and published by . This book was released on 2014 with total page 69 pages. Available in PDF, EPUB and Kindle. Book excerpt: In today’s world everything is going toward speed and comfort. This includes differenttechnologies which their improvement leads to an easier life for human beings. One of thesetechnologies is nanotechnology that deals with fabrication and structures of objects in nanometerscale.Today’s technology and science has proved that nanowires are excellent candidates forfabrication of many different devices and their components. These devices take less space whilehaving high performance. Nanowires are one-dimensional structures that have many applicationsincluding a variety of sensors, transistors as well as energy-storage devices like solar cells andLi-ion batteries.Fabrication of nanowires is still under research and many universities and institutes are trying tofind methods that are both time- and cost-efficient. This is a challenging subject since there aremany parameters involved in the process and each of these parameters affect the final results offabrication.The concentration of this work is on fabrication of silicon nanowires. Silicon is the second-mostabundant element on the earth and therefore has a more reasonable price compare to otherelements.There are many different techniques to fabricate silicon nanowires but most of these methods areexpensive and time consuming.In this work we have used a top-down method which is time and cost efficient compare to otherfabrication methods. There are three main steps in our work; anisotropic etching to texture thesurface of the silicon wafer, electrochemical etching to produce the nanowires and a post-etchingprocess in order to clean the surface of the sample. Wafer type, etching duration, temperature,and the applied current are the parameters that are studied during the experiments. The fabricatednanowires are captured and characterized using scanning electron microscopy.