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Characterization of Extreme Ultraviolet Imaging Systems
Language: en
Pages: 500
Authors: Edita Tejnil
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Type: BOOK - Published: 1997 - Publisher:

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Extreme Ultraviolet Imaging and Resist Characterization Using Spatial Filtering Techniques
Language: en
Pages: 336
Authors: Michael David Shumway
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Type: BOOK - Published: 2004 - Publisher:

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Characterization of an Expanded-field Schwarzschild Objective for Extreme Ultraviolet Lithography
Language: en
Pages: 16
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Type: BOOK - Published: 1994 - Publisher:

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The performance of a new 10x-reduction Schwarzschild system for projection imaging at 13.4 nm wavelength is reported. The optical design is optimized to achieve
At-wavelength Characterization of the Extreme Ultraviolet Engineering Test Stand Set-2 Optic
Language: en
Pages: 18
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Type: BOOK - Published: 2001 - Publisher:

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At-wavelength interferometric characterization of a new 4x-reduction lithographic-quality extreme ultraviolet (EUV) optical system is described. This state-of-t
Radiation characteristics of extreme UV and soft X-ray sources
Language: en
Pages: 154
Authors: Tobias Mey
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Type: BOOK - Published: 2015 - Publisher: Göttingen University Press

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Electromagnetic radiation in the extreme UV and soft x-ray spectral range is of steadily increasing importance in fundamental research and industrial applicatio