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Modeling Chemical Vapor Deposition and Etching Processes
Language: en
Pages:

Modeling Chemical Vapor Deposition and Etching Processes

Authors: E. Hyman
Categories:
Type: BOOK - Published: 1995 - Publisher:

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Multiscale Modeling of Chemical Vapor Deposition and Plasma Etching
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Multiscale Modeling of Chemical Vapor Deposition and Plasma Etching

Authors: Seth Thomas Rodgers
Categories:
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Modeling of Chemical Vapor Deposition of Tungsten Films
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Modeling of Chemical Vapor Deposition of Tungsten Films

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Type: BOOK - Published: 2013-11-11 - Publisher: Birkhäuser

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Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization o
Fundamental Gas-phase and Surface Chemistry of Vapor-phase Deposition II and Process Control, Diagnostics and Modeling in Semiconductor Manufacturing IV
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Fundamental Gas-phase and Surface Chemistry of Vapor-phase Deposition II and Process Control, Diagnostics and Modeling in Semiconductor Manufacturing IV

Authors: Electrochemical Society. High Temperature Materials Division
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Computational Modeling in Semiconductor Processing
Language: en
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Computational Modeling in Semiconductor Processing

Authors: M. Meyyappan
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This book provides you with in-depth coverage of the models, governing equations, and numerical techniques suitable for process simulation -- so you can give yo